Nowadays, to properly design and develop advanced materials capable to preserve for long times their performance under aggressive environments such as power generation plants, renewables, nuclear reactors and electronics of new generation, transport on ground and on space, aeronautics, catalysis, biomedical implants, the optimization of metallurgical processes involved is crucial.
Technologies
In this section it is possible to view, also through targeted research, the technologies inserted in the PROMO-TT Database. For further information on the technologies and to contact the CNR Research Teams who developed them, it is necessary to contact the Project Manager (see the references at the bottom of each record card).
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Molecular doping (MD) is a doping method based on the use of liquid solutions. The dopant precursor is in liquid form and the material to be doped is immersed in the solution. During the immersion process, the molecule containing the dopant atom is deposited on the surface of the material forming a self-assembled monolayer, that is, ordered and compact. Through a subsequent heat treatment, the molecule decomposes and the dopant diffuses.
Chemical solution deposition of metal-organic precursors have favoured the research and development of thin films of simple and complex oxides such as Pb(Zr,Ti)O3, and Al2O3, up to their industrial application in pyroelectric and capacitor devices. Deposition methods used are spin-on and dip-coating. The advantages of the techniques are:
(i) low cost of equipment and chemicals
(ii) large area deposition
(iii) low crystallisation temperatures