Silicon nanowires (SiNWs) are 1D structures with diameter ranging from few tens to hundreds of nanometers and length varying from few tens of nanometers to millimiters. SiNWs are fabricated in the labs of the IMM-CNR, Rome Unit, by using bottom-up technologies such as plasma enhanced chemical vapor deposition (PECVD) at low growth temperature ((≤350°C), allowing the use of plastic and glassy substrates. Their electrical properties can be tuned by controlling the p/n doping during the growth.
Technologies
In this section it is possible to view, also through targeted research, the technologies inserted in the PROMO-TT Database. For further information on the technologies and to contact the CNR Research Teams who developed them, it is necessary to contact the Project Manager (see the references at the bottom of each record card).
Displaying results 1 - 5 of 5
We propose a portable chemical analysis system capable of identifying chemical substances at trace concentrations (sub-ppm), even in case of a complex matrix of interfering species.
The invention is about the development of a device and its methodology for measuring the active and reactive sound intensity from the impedance computation. The active intensity is calculated directly in the frequency domain multiplying the complex impedance and power spectrum of the air particle velocity. A second line of post-processing is applied to obtain the overall complex sound intensity.
This invention comprises an interrogation and readout differential method for chemical sensors based on Surface Plasmon Resonances (SPR). The integration of the SPR sensing unit (chip or other), as intermediate reflecting element of a Fabry-Perot (FP) optical resonator, is the starting point for the application of this method.