The NanoMicroFab infrastructure, support companies operating in the field of micro and nanoelectronics through the supply of materials, development of processes, design, fabrication and characterization of materials and devices. NanoMicroFab makes use of existing CNR facilities of the Institute of Microelectronics and Microsystems, the Institute of Photonics and Nanotechnologies and the Institute for the Structure of Matter and provides: • a complete line of development of devices based on wide band gap semiconductors.
Technologies
In this section it is possible to view, also through targeted research, the technologies inserted in the PROMO-TT Database. For further information on the technologies and to contact the CNR Research Teams who developed them, it is necessary to contact the Project Manager (see the references at the bottom of each record card).
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The technology refers to an innovative plasma (ionized gas) source operating at atmospheric pressure and low electric power levels. A cold plasma is produced, characterized by an ion temperature significantly lower than the electron temperature. Partial ionization of a Helium flux is induced by a time-varying electric field in between two parallel grids, both perpendicular to the flux itself.