Technologies

Chemical solution deposition of metal-organic precursors have favoured the research and development of thin films of simple and complex oxides such as Pb(Zr,Ti)O3, and Al2O3, up to their industrial application in pyroelectric and capacitor devices. Deposition methods used are spin-on and dip-coating. The advantages of the techniques are:

(i) low cost of equipment and chemicals

(ii) large area deposition

(iii) low crystallisation temperatures

The technology refers to an innovative plasma (ionized gas) source operating at atmospheric pressure and low electric power levels. A cold plasma is produced, characterized by an ion temperature significantly lower than the electron temperature. Partial ionization of a Helium flux is induced by a time-varying electric field in between two parallel grids, both perpendicular to the flux itself.