Technologies

Silicon nanowires (SiNWs) are 1D structures with diameter ranging from few tens to hundreds of nanometers and length varying from few tens of nanometers to millimiters. SiNWs are fabricated in the labs of the IMM-CNR, Rome Unit,  by using bottom-up technologies such as plasma enhanced chemical vapor deposition (PECVD) at low growth temperature ((≤350°C), allowing the use of plastic and glassy substrates. Their electrical properties can be tuned by controlling the p/n doping during the growth.

VisLab laboratory of IMM possesses a latest generation Raman micro-spectroscope equipped for vibrational measurements with high spatial and spectral resolution, at controlled temperature and in fast-imaging. The apparatus can be used to collect information and chemico-physical maps without the need for sample preparation and alteration, therefore for non-destructive studies and in operating conditions.

The Nikon reference centre at IBPM ( www.imagingplatformibpmcnr.it ) is a microscopy platform for high resolution imaging of fixed samples and live cells (time-lapse video recording, both wide field and confocal spinning disk). Multimodal (fluorescence and transmitted light) and multidimensional (in x,y,z, 4 wavelengths, over time) acquisition modes are in place.