Technologies

Nowadays, to properly design and develop advanced materials capable to preserve for long times their performance under aggressive environments such as power generation plants, renewables, nuclear reactors and electronics of new generation, transport on ground and on space, aeronautics, catalysis, biomedical implants, the optimization of metallurgical processes involved is crucial.

The NanoMicroFab infrastructure, support companies operating in the field of micro and nanoelectronics through the supply of materials, development of processes, design, fabrication and characterization of materials and devices. NanoMicroFab makes use of existing CNR facilities of the Institute of Microelectronics and Microsystems, the Institute of Photonics and Nanotechnologies and the Institute for the Structure of Matter and provides: • a complete line of development of devices based on wide band gap semiconductors.

The proposed technology offers a novel and versatile method for detecting cracks in insulating materials of electrically polarized metal devices, i.e. dielectric coatings on metals, especially in low-pressure gas environments. It uses an ionized plasma that interacts uniformly with the insulating surface, allowing to detect defects invisible to the naked eye. The detection occurs in a single test without changing the environmental conditions and without risking harmful electrical discharges.