High-vacuum

# Record card
292
Description

The invention consists of a method and apparatus for the delivery at low pressure (equal to or less than 10-7 Torr) of monoatomic fluorine for reaction with surfaces in an ultra-clean environment. Thanks to the low pressure values involved in the proposed method, the risks associated with the use of fluorine are reduced to a minimum.

Thematic areas
Chemicals & Physics / Inorganic substances
ICT & Electronics / Electronics and microelectronics
ICT & Electronics / Nanotechnologies related to electronics and microelectronics
Additive and advanced industrial manufacturing / Vacuum/High vacuum technologies
Materials / Metals & alloys
Materials / Properties of materials, corrosion, degradation
Materials / Processes of production & treatment of materials
Materials / Photo-active & graphene-based materials
Materials / Semiconductors and Superconductors
Chemicals & Physics / Micro and nanotechnology related to physical, chemical and exact sciences